Design and Simulation of Compact, High Capacitance Ratio RF MEMS Switches using High-K Dielectric Material

نویسندگان

  • Sarvjeet Kaur
  • Vijay Kumar Anand
  • Dinesh Kumar
چکیده

In this paper, RF MEMS Capacitive Switches for two different dielectrics hafnium oxide (HfO2) and silicon nitride (Si3N4) are presented. The switches have been characterized and compared in terms of RF performance. The major impact of the change from Si3N4 to HfO2 having dielectric constant 20 is the reduction in overall dimension of the switch; capacitive area is reduced by 66% leading to overall reduction of about 41%. For 50nm thick HfO2, the HfO2 switches systematically shows an improvement in the isolation by more than -8dB (-35.16 versus -26.03 dB) and better insertion Loss at 12 GHz frequency compared to Si3N4. This makes HfO2 an attractive dielectric for RF MEMS switch for new generation of low-loss high – linearity microwave switches.

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تاریخ انتشار 2013